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SCIENTIFIC DEVELOPMENTS OF THE D. MENDELEEV UNIVERSITY OF CHEMICAL TECHNOLOGY OF RUSSIA AND UNIVERSITY PARTNERS
Название Producing nickel highly porous materials by electrodeposition
DOI 10.17580/tsm.2024.08.05
Автор Khazanov N. A., Asnis N. A., Vagramyan T. A., Rozhkov I. M.
Информация об авторе

Mendeleev University of Chemical Technology of Russia, Moscow, Russia

N. A. Khazanov, Second-year Postgraduate Student, e-mail: khazanovk@mail.ru
N. A. Asnis, Lead Engineer of the Department of Innovative Materials and Corrosion Protection, Candidate of Technical Sciences
T. A. Vagramyan, Head of the Department of Innovative Materials and Corrosion Protection, Professor, Doctor of Technical Sciences
I. M. Rozhkov, Second-year Master’s degree Student, the Department of Innovative Materials and Corrosion Protection

Реферат

The article presents studies on a possibility of producing highly porous cellular materials (HPCM) from nickel using electroplating by copying a polymer matrix from polyurethane foam. To get more uniform thickness of structures, it has been determined to use an intermittent deposition mode with leveling agents. It has been found that to produce nickel-based porous materials after annealing a polymer frame average thickness of a nickel coating should be 30–40 μm or more. Uniformity was assessed by comparing coating thickness in depth and on the surface of metallic HPCM. By comparing these two values, we can make a conclusion about uniformity in percentage. Studies on electrical deposition of nickel on HPCM have showed that it is rather difficult to maintain current density constant, factoring into a branched structure of the surface on HPCM along width, depth and height; besides, there are concentrated difficulties with delivery of nickel ions in depth of HPCM. Therefore, electrolysis is conducted at DC bath voltage, contributing to more uniform coatings along a total volume of HPCM. The use of a pulse (intermittent) mode of electrical deposition showed a significant improvement of performance: at a delay of 0.2 s and a pulse duration of 1 s metal is significantly better distributed at a bath voltage of 4.7 V. To get the set coating thickness (60 μm on average), the electrolysis duration increases almost insignificantly. The article proposes the following composition of the electrolyte for nickel plating, g/l: 175 nickel sulfate; 20 nickel chloride; 30 amber acid; 2 saccharin; 0.1 azodye. The article contains electrolysis parameters for producing nickel-based HPCM.

Ключевые слова Metallic catalysts, metallization of highly porous cellular materials, nickel plating, nickel coating, metallic highly porous cellular materials, nickel HPCM, electroplating, electrical deposition, metallic foam
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