ATOMIC STRUCTURES AND METHODS OF
STRUCTURAL INVESTIGATIONS
ArticleName
FABRICATION OF SINGLE–CRYSTAL ORIENTED
SUBMICRON STRUCTURES FROM BI AND Bi—Sb
FILMS ON SiO2/Si SUBSTRATE
ArticleAuthors
A.I. Il’in, A.V. Chernykh and C.V. Dubonos
ArticleAuthorsData
A.I. Il’in, A.V. Chernykh and C.V. Dubonos, Institute
of Microelectronics Technology & High Purity
Materials, Russian Academy of Sciences
Abstract
Large island-crystallites of micron size obtained from
thermal deposited continuous Bi and Bi—Sb(20%)
films on amorphous SiO2/Si substrate during ultrahigh
vacuum annealing at 240-270 oС have been studied
by scanning electron and atomic-force microscopes.
Conglomerations of islands with various in-plane orientations
and distinct faceting have been observed to
form fist followed by separate islands with the preferred
(111)Bi orientation parallel to the substrate surface. Sb
doping of Bi promotes the formation of large single
crystals and decreases their faceting. A truncated
polyhedral pyramid proved to be the most common
and stable form of the islands. The evolution of island
size and orientation during annealing is accounted for
by the dilution of disadvantageously oriented and small
grains due to the diffusion of atoms on the substrate
surface, and the increase in the height is attributable
to the successive growth of the most densely packed
facets of the grains. Single crystal structures oriented
relative to the faceting planes have been fabricated
from the largest separate grains with a lateral size of
500 to 1500 nm for electron transport measurements
by atomic-force and electron microscopes, electron
lithography and ion beam etching.
keywords
Bismuth, thin films, electron-beam lithography,
atomic-force microscopy, microstructures.
Language of full-text
russian
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