EPITAXIAL LAYERS AND MULTILAYERED COMPOSITIONS | |
Название | Detection method of silicon–sapphare interface state in silicon on sapphire thin layers |
Автор | S. V. Tikhov, D. A. Pavlov, N. O. Krivulin |
Информация об авторе | University of Nizhniy Novgorod S. V. Tikhov, D. A. Pavlov, N. O. Krivulin |
Реферат | We suggested the easy detection method of of silicon−sapphire interface state in silicon on sapphire thin layers. This method base on photo−e.m.f. satiation measurements and volt−current characteristic in Au/Si diode structure. It is shown that in silicon on sapphire layers that have been obtained by low temperature molecular beam epitaxy in the silicon−sapphire interface layer of p−type conductivity forms. |
Ключевые слова | Silicon on sapphire, diode structure, field effect, photo−e.m.f. |
Библиографический список | 1. Papkov, V. S. Epitaksial'nye kremnievye sloi na dielektricheskikh podlozhkakh i pribory na ikh osnove / V. S. Papkov, M. V. Tsybul'nikov. − M. : Energiya, 1979. − 88 s. |
Language of full-text | русский |
Полный текст статьи | Получить |