EPITAXIAL LAYERS AND MULTILAYERED COMPOSITIONS | |
ArticleName | Detection method of silicon–sapphare interface state in silicon on sapphire thin layers |
ArticleAuthor | S. V. Tikhov, D. A. Pavlov, N. O. Krivulin |
ArticleAuthorData | University of Nizhniy Novgorod S. V. Tikhov, D. A. Pavlov, N. O. Krivulin |
Abstract | We suggested the easy detection method of of silicon−sapphire interface state in silicon on sapphire thin layers. This method base on photo−e.m.f. satiation measurements and volt−current characteristic in Au/Si diode structure. It is shown that in silicon on sapphire layers that have been obtained by low temperature molecular beam epitaxy in the silicon−sapphire interface layer of p−type conductivity forms. |
keywords | Silicon on sapphire, diode structure, field effect, photo−e.m.f. |
References | 1. Papkov, V. S. Epitaksial'nye kremnievye sloi na dielektricheskikh podlozhkakh i pribory na ikh osnove / V. S. Papkov, M. V. Tsybul'nikov. − M. : Energiya, 1979. − 88 s. |
Language of full-text | russian |
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