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EPITAXIAL LAYERS AND MULTILAYERED COMPOSITIONS
ArticleName Detection method of silicon–sapphare interface state in silicon on sapphire thin layers
ArticleAuthor S. V. Tikhov, D. A. Pavlov, N. O. Krivulin
ArticleAuthorData

University of Nizhniy Novgorod

S. V. Tikhov, D. A. Pavlov, N. O. Krivulin

Abstract

We suggested the easy detection method of of silicon−sapphire interface state in silicon on sapphire thin layers. This method base on photo−e.m.f. satiation measurements and volt−current characteristic in Au/Si diode structure. It is shown that in silicon on sapphire layers that have been obtained by low temperature molecular beam epitaxy in the silicon−sapphire interface layer of p−type conductivity forms.

keywords Silicon on sapphire, diode structure, field effect, photo−e.m.f.
References

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