MATERIALS SCIENCE AND TECHNOLOGY. SEMICONDUCTORS | |
ArticleName | Layering of GeSi solid solution on the GaAs and Si substrates |
ArticleAuthor | E. F. Venger, L. A. Matveeva, P. L. Nelyuba |
ArticleAuthorData | V. Lashkarov Institute of Semiconductor Physics, the National Academy of Science of Ukraine: E. F. Venger L. A. Matveeva P. L. Nelyuba |
Abstract | The electronic, optical and mechanical properties of heterosystems with Ge1−xSix solid solution films on the GaAs (x = 0–0.04) and Si (x = 0.75) substrates have been studied. We used electroreflectance modulation spectroscopy for the films and the substrates, classical spectroscopy in the intrinsic absorption region of the films and mechanical stress measurements in the films and in the substrate. We show that the Ge1−xSix films can change composition with the formation of other solid solution structures both during film deposition and under γ−irradiation. There is a possibility to reduce the mechanical stresses, to improve the electronic parameters of the films and the substrates at the interface, and to produce heterosystems without bending deformation. |
keywords | Heterostructures, GeSi solid solution, γ−irradiation, electroreflectance, mechanical stresses relaxation |
References | 1. Konakova, R. V. Vliyanie odnorodnosti tverdogo rastvora Ge1−xSix na vykhod godnykh LPD−diodov / R. V. Konakova, L. A. Matveeva, Yu. A. Tkhorik // Materialy VI koordinatsionnogo soveshchaniya po issledovaniyu i primeneniyu splavov kremniy—germaniy − Tbilisi, 1986. − S. 84. |
Language of full-text | russian |
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